W&L NCS 3-150 Microwave Plasma CVD System
W&L NCS 3-150 Microwave Plasma CVD System
Low Temperature CVD Systems
Ideal for substrates requiring lower temp deposition
- Microwave plasma linear antenna systems
- Low-temperature poly diamond deposition (<400°C)
- For glass, polymers and other substrates requiring lower temps
- Scalable for large substrates and moving web: 1 meter wide by multiple meter depth
- Small system available for R&D (<8” diameter)